Evolution of Nanocrystalline Graphite’s Physical Properties during Film Formation

Nanocrystalline graphite (NCG) layers represent a good alternative to graphene for the development of various applications, using large area, complementary metal-oxide semiconductor (CMOS) compatible technologies. A comprehensive analysis physical properties NCG layers—grown different time periods via plasma-enhanced chemical vapour deposition (PECVD)—was conducted. The correlation between measured (thickness, optical constants, Raman response, electrical performance, and surface morphology) growth was established further develop functional structures. All thin films show an increased grain size improved crystalline structure, with better properties, as plasma is increased. Moreover, spectroscopic ellipsometry investigations their thickness together roughness extracted from atomic force microscopy examinations resulting Hall measurements, point out transition nucleation three-dimensional in PECVD process around five-minute mark.